Right after contact windows are etched, the entire wafer is roofed with a skinny layer of aluminum in a sputtering chamber. Any time a metallic mask is applied to the aluminum layer, a community of slim metal connections or wires is formed, creating a path for your circuit.
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Subsequent, the wafer is uniformly coated using a thick, mild-sensitive liquid referred to as photoresist. Parts on the wafer are chosen for exposure by carefully aligning a mask among an ultraviolet gentle supply along with the wafer. While in the clear parts of the mask, gentle passes by and exposes the photoresist.
During the etch action, damp acid or plasma dry gasoline is placed on the wafer to remove the percentage of the nitride layer that is definitely unprotected via the hardened photoresist.
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Pretty much, this articles represents an SSD chemical ssd chemical glossary which defines and points out a variety of important phrases and meanings used or requested during the SSD/SCDN/DFX underground black industry cleaning economy.
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Underneath the universal SSD solution chemical compound, you can also find the organic and automatic chemical key in the same SSD solution A21 criteria. [SSD/2218]
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